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Profile: Ting-Ying Chung

Email: tychung@berkeley.edu

Research Interests
  • Ion, Photon, and Electron Texturing of Organic Thin Films

Education

  • PhD student (Chemical Engineering), UC Berkeley, 2007-present
  • BS (Chemical Engineering), National Tsing Hua University, Taiwan, 2005

Publications

  • T.-Y. Chung, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, M. Li, and E. A. Hudson, "Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group", Plasma Process. Polym. 8 (2011) 1068
  • F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. B. Graves, M. Li, D. Wang, C. Andes, and E. A. Hudson, "Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry", J. Vac. Sci. Technol. B 28 (2010) 993
  • T.-Y. Chung, D. Nest, D. B. Graves, F. Weilnboeck, R. L. Bruce,G. S. Oehrlein, D. Wang, M. Li and E. A. Hudson, "Electron, ion and vacuum ultraviolet photon effects in 193nm photoresist surface roughening", J. Phys. D: Appl. Phys. 43 (2010) 272001
  • D. Nest, T.-Y. Chung, J. J. Vegh, D. B. Graves, R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, B. K. Long and C. G. Willson, "Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PaMS", J. Phys. D, Appl. Phys. 43 (2010) 085204
  • D. Nest, T. Y. Chung, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, D. Y. Wang, C. Andes, and E. A. Hudson, "Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment", Plasma Process. Polym. 6 (2009) 649
  • M. J. Titus, D. G. Nest, T. Y. Chung, and D. B. Graves, "Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system", J. Phys. D, Appl. Phys. 42 (2009) 245205

Presentations

  • T.-Y. Chung, N. Ning, J.-W. Chu, D. B. Graves, E. Bartis, J. Seog, and G. S. Oehrlein, "Plasma Deactivation of Pyrogenic Biomolecules: Vacuum Ultraviolet Photon and Radical Beam Effects on Lipid A", AVS 58th International Symposium and Exhibition, Oral presentation, Nashville, USA, 2011.
  • T.-Y. Chung, D. B. Graves, F. Weilnboeck, G. S. Oehrlein, E. A. Hudson, and M. Li, "Ion and vacuum ultraviolet photon beam effects in 193 nm photoresist surface roughening: the dependence of polymer structure", AVS 57th International Symposium and Exhibition, Oral contribution, Albuquerque, USA, 2010.
  • T.-Y. Chung, D. Nest, G. Choudhary, J.J. Vegh, D.B. Graves, F. Weilnboeck, G.S. Oehrlein, E.A. Hudson, M. Li, and D. Wang, "Electron, Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Roughening", AVS, Oral contribution, San Jose, USA, 2009

Honors and Awards

  • Outstanding Graduate Student Instructor, 2009-2010
  • Outstanding Graduate Student Instructor, 2008-2009