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Profile: Joe Lee

Email: jlee_kaz@berkeley.edu

Research Interests

  • Plasma exposure of low-k dielectric films
  • Beam system VUV studies on low-k dielectric films

Education

  • PhD student (Chemical Engineering), UC Berkeley, 2008-present
  • BS (Chemical Engineering), Georgia Institute of Technology, 2008

Employment History

  • Graduate student instructor, UC Berkeley, January-May 2010

Publications

  • J. Lee and D. B. Graves. "Synergistic damage effects of vacuum ultraviolet photons and O2 in SiCOH ultra-low- k dielectric films." J. Phys. D: Appl. Phys. 43 (2010) 425201
  • S. Behera, J. Lee, S. Gaddam, S. Pokharel, J. Wilks, F. Pasquale, D. B. Graves, and J. A. Kelber. "Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH3." Appl. Phys. Lett. 97 (2010) 034104
  • J. Lee and D. B. Graves. "The effect of VUV radiation from Ar/O2 plasmas on low- k SiOCH films." J. Phys. D: Appl. Phys. 44 (2011) 325203

Presentations

  1. J. Lee, D.B. Graves, "Effects of VUV Radiation and Diffusion of O2 in p-SiOCH low-k films",
    AVS, Oral presentation, Albuquerque, USA, 2010
  2. J. Lee, D.B. Graves, "Modeling the penetration of vacuum ultraviolet photons in porous low-k films",
    AVS, Oral presentation, Nashville, USA, 2011
  3. J. Lee, D.B. Graves, "Synergistic damage effects of VUV photons/O2 in SiCOH low-k films,"
    AVS, Oral presentation, San Jose, USA, 2009
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