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Dr. Daniel Elg


Postdoctoral Scholar
Email: daniel.elg@berkeley.edu

Research Interests:                                               

  • Plasma-Material Interactions (both solid & liquid surfaces)
  • Nanomaterial Synthesis
  • Plasma Diagnostics at atmosphere and at low pressure
  • Low-temperature plasma processing
  • Design & Control of plasma sources

Education and Experience:

  • Post-Doctoral Research: University of California, Berkeley (Sep. 2016-present)
             Department of Chemical & Biomolecular Engineering
             Advisor: Prof. David B. Graves

  • PhD:  University of Illinois at Urbana-Champaign (Aug. 2016)
             Department of Nuclear, Plasma, and Radiological Engineering
             Advisor: Prof. David N. Ruzic
             Dissertation Title: Removal of Sn from Extreme Ultraviolet Collector Optics by an In-Situ Hydrogen Plasma

  • MS:   University of Illinois at Urbana-Champaign (May 2013)
             Department of Nuclear, Plasma, and Radiological Engineering
             Advisor: Prof. David N. Ruzic
             Thesis Title: Magnetic Mitigation of Ionic Debris for Extreme Ultraviolet Lithography Sources

  • BS:    Franklin W. Olin College of Engineering (May 2011)
             Electrical and Computer Engineering

Journal Articles:

  1. D.T. Elg, I. Yang, D.B. Graves, "Production of TEMPO by O Atoms in Atmospheric Pressure Non-Thermal Plasma-Liquid Interactions" (2017).
  2. D.T. Elg, G.A. Panici, S. Liu, G. Girolami, S.N. Srivasta, and D.N. Ruzic, "Removal of Tin from Extreme Ultraviolet Collector Optics by Etching with an In-Situ Hydrogen Plasma" (2017).
  3. Q. Yang, K. Kalathiparambil, D.T. Elg, D. Ruzic, W.M. Kriven, "Microstructural Damage of α-Al2O3 by High Energy Density Plasma", Acta Materialia 132, 479-490 (2017).
  4. D.T. Elg, G.A. Panici, J.S. Peck, S.N. Srivastava, D.N. Ruzic, "Modeling and Measurement of Hydrogen Radical Densities of In-Situ Plasma-Based Sn Cleaning Source", Journal of Micro/Nanolithography, MEMS, & MOEMS 16(2) (2017).
  5. D.T. Elg, J.R. Sporre, G.A. Panici, S.N. Srivastava, D.N. Ruzic, "In-Situ Collector Cleaning and EUV Reflectivity Restoration by Hydrogen Plasma for EUV Sources", Journal of Vacuum Science & Technology A 34(2) (2016).
  6. J.R. Sporre, D.T. Elg, K.K. Kalathiparambil, D.N. Ruzic, "Modeling and Measuring the Transport and Scattering of Energetic Debris in an EUV Plasma Source", Journal of Micro/Nanolithography, MEMS, & MOEMS 15(1) (2016).
  7. D.T. Elg, J.R. Sporre, D. Curreli, I.A. Shchelkanov, D.N. Ruzic, K.R. Umstadter, "Magnetic Debris Mitigation System for EUV Sources", Journal of MIcro/Nanolithography, MEMS, & MOEMS 14(1) (2015).

Conference Presentations:

  1. D.T. Elg, I. Yang, D.B. Graves, "TEMPO Production by O Atoms in Plasma-Liquid Interactions Driven by Spatio-Temporally Varying Atmospheric Pressure Plasma Jet", 8th Annual Meeting of the DOE Center for Predictive Control of Plasma Kinetics, Bethesda, MD (2017).
  2. D.T. Elg, G.A. Panici, D.N. Ruzic, "Study of Sn Removal Processes for In-Situ Collector Cleaning", Poster Presentation, International Symposium on Extreme Ultraviolet Lithography, Hiroshima, Japan (2016).
  3. D.T. Elg, G.A. Panici, S.N. Srivasta, D.N. Ruzic, "Study of Sn Removal Processes for In-Situ Collector Cleaning", Oral Presentation, SPIE Advanced Lithography, San Jose, CA (2016).
  4. D.T. Elg, G.A. Panici, S.N. Srivasta, D.N. Ruzic, "In-Situ EUV Collector Cleaning by Hydrogen Plasma", Oral Presentation, International Symposium on Extreme Ultraviolet Lithography, Maastricht, Netherlands (2015).
  5. D.T. Elg, G.A. Panici, S.N. Srivasta, D.N. Ruzic, "Collector Optic Cleaning by In-Situ Hydrogen Plasma", Poster Presentation, SPIE Advanced Lithography, San Jose, CA (2015).
  6. D. Elg, S. Srivastava, I. Shchelkanov, D.N. Ruzic, "Collector Cleaning and EUVR Restoration by In-Situ Hydrogen Plasma", Oral Presentation, International Symposium on Extreme Ultraviolet Lithography, Washington, DC (2014).
  7. D. Elg, S. Srivastava, I. Shchelkanov, D.N. Ruzic "In-Situ Plasma Cleaning Method for Collector Optics", Oral Presentation, SPIE Advanced Lithography, San Jose, CA (2014).
  8. D. Elg, J. Sporre, D.N. Ruzic, S.N. Srivastava, I.V. Fomenkov, D.C. Brandt, "In-Situ Plasma Cleaning of Collector Optics", Oral Presentation, International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan (2013).
  9. D. Elg, J. Sporre, D. Curreli, D.N. Ruzic, K.R. Umstadter, "Magnetic Mitigation of Debris from EUV Sources", Poster Presentation, SPIE Advanced Lithography, San Jose, CA (2013).
  10. J. Sporre, D. Elg, D.N. Ruzic, S.N. Srivastava, I.V. Fomenkov, D.C. Brandt, "Collector Optic In-Situ Sn Removal Using Hydrogen Plasma", Poster Presentation, SPIE Advanced Lithography, San Jose, CA (2013).
  11. D.N. Ruzic, J. Sporre, D. Elg, D. Curreli, "Contamination Concerns at the Intermediate Focus of an Extreme-Ultraviolet Light Source", Oral Presentation, SPIE Advanced Lithography, San Jose, CA (2013).
  12. J. Sporre, D. Elg, D. Andruzcyk, T. Cho, D.N. Ruzic, S.N. Srivastava, D.C. Brandt, "In-Situ Sn Contamination Removal by Hydrogen Plasma", SPIE Advanced Lithography, San Jose, CA (2012).
  13. D. Andruczyk, J. Sporre, D. Elg, T. Cho, D.N. Ruzic, "Energetic Ion and Neutral Energy Analyzer for Extreme-Ultraviolet Light Sources", SPIE Advanced Lithography, San Jose, CA (2012).
  14. J. Sporre, D. Elg, D. Andruzcyk, T. Cho, D.N. Ruzic, S.N. Srivastava, D.C. Brandt, "Development of an In-Situ Method for Cleaning EUV Collector Optics, International Symposium on Extreme Ultraviolet Lithography, Miami, FL (2011).

Conference Proceedings:

  1. D.T. Elg, I. Yang, D.B. Graves, "TEMPO Production by O Atoms in Plasma-Liquid Interactions Driven by Spatio-Temporally Varying Atmospheric Pressure Plasma Jet", 8th Annual Meeting of the DOE Center for Predictive Control of Plasma Kinetics, Bethesda, MD (2017).
  2. D.T. Elg, G.A. Panici, S.N. Srivastava, D.N. Ruzic, "Study of Sn Removal Processes for In-Situ Collector Cleaning", Proceedings of SPIE 9776, 97760M (2016).
  3. D.T. Elg, G.A. Panici, S.N. Srivastava, D.N. Ruzic, "Collector Optic Cleaning by In-Situ Hydrogen Plasma", Proceedings of SPIE 9422, 94222H (2015).
  4. D. Elg, J. Sporre, D. Curereli, D.N. Ruzic, K.R. Umstadter, "Magnetic Mitigation of Debris from EUV Sources", Proceedings of SPIE 8679, 86792M (2013).
  5. J.R. Sporre, D. Elg, D.N. Ruzic, S.N. Srivastava, I.V. Fomenkov, D.C. Brandt, "Collector Optic In-Situ Sn Removal Using Hydrogen Plasma", Proceedings of SPIE 8679, 86792H (2013).
  6. D.N. Ruzic, J. Sporre, D. Elg, D. Curreli, "Contamination Concerns at the Intermediate Focus of an Extreme-Ultraviolet Light Source", Proceedings of SPIE 8679, 86790D (2013).
  7. J. Sporre, D. Elg, D. Andruczyk, T. Cho, D.N. Ruzic, S.N. Srivastava, D.C. Brandt, "In-Situ Sn Contamination Removal by Hydrogen Plasma", Proceedings of SPIE 8322, 83222L (2012).
  8. D. Andruczyk, J. Sporre, D. Elg, T. Cho, D.N. Ruzic, "Energetic Ion and Neutral Energy Analyzer for Extreme-Ultraviolet Light Sources", Proceedings of SPIE 8322, 832227 (2012).

Honors and Awards:

  • Mavis Future Faculty Fellowship, 2015-2016.
  • International EUVL Symposium Student Scholarship, 2014-2015.
  • Member of Alpha Nu Sigma, 2013.
  • F.W. Olin Scholarship (Full Tuition), 2007-2011.
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